Synopsys Introduces Proteus LRC for Lithography Verification
SAN JOSE, Calif., March 1, 2011 – SPIE Advanced Lithography—Synopsys, Inc. (Nasdaq: SNPS), a world leader in software and IP for semiconductor design, verification and manufacturing, today introduced Proteus LRC for lithography verification. Proteus LRC provides comprehensive, process-window-aware checking features to identify locations in a design that are sensitive to process variations, thereby enabling corrective action to be taken prior to committing a design to manufacture. Proteus LRC is integrated into the Proteus Mask Synthesis flow and is targeted for use by OPC and mask data preparation groups at semiconductor manufacturers like Micron Technology, Inc.
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