Mentor Graphics and GLOBALFOUNDRIES Extend RET and OPC Collaboration to 28nm
WILSONVILLE, Ore., March 1, 2011—Mentor Graphics Corporation (NASDAQ: MENT) and GLOBALFOUNDRIES today announced that the companies have extended their collaboration on computational lithography to the 28nm technology node. Building on a successful deployment at 65nm and 45nm, GLOBALFOUNDRIES will leverage Mentor’s Calibre® computational lithography platform to support its advanced mask production needs at 28nm. The announcement underscores the two companies’ commitment to collaboration in order to deliver enablement technology for advanced nodes.
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