industry news
Subscribe Now

TSMC Qualifies Magma’s QCP Extractor for 28-nm Designs

SAN JOSE, Calif., July 13, 2011 – Magma Design Automation Inc. (Nasdaq:LAVA), a provider of chip design solutions, today announced TSMC has included the QCP™ extractor in TSMC’s quarterly EDA qualification report for 28-nanometer (nm) integrated circuits (ICs). This qualification gives designers additional confidence in using QCP to address the increasing complexity of ICs implemented in TSMC’s 28-nm processes.

New device structures and the growing number of metal layers used at the 28-nm node are introducing many additional parasitic effects that can affect the performance of ICs. To create simulation models that accurately predict circuit performance, designers need accurate extraction capabilities. QCP meets TSMC’s 28-nm process requirements for via etch, multi-dimensional etch tables, contact biasing and additional via rules to ensure required support. In addition to meeting the complex requirements of 28-nm design, QCP provides advanced extraction capabilities for ICs implemented in 40-nm and larger process technologies.

“Close collaboration with strategic partners continues to be the key to achieving TSMC’s goal of providing the IC industry’s most advanced design ecosystem,” said Suk Lee, director, Design Infrastructure Marketing Division, TSMC. “Qualifying QCP, Magma’s next-generation extraction tool, is another milestone in ensuring mutual customers’ silicon success at 28 nm.”

“Already proven to provide faster multi-corner extraction than traditional tools, the adoption of QCP is rapidly increasing,” said Premal Buch, general manager of Magma’s Design Implementation Business Unit. “TSMC’s qualification of QCP provides our customers additional confidence in its ability to quickly and accurately extract parasitics on 28-nm designs.”

QCP: Meeting the Extraction Challenges of 28-nm Design

QCP was architected to provide the fastest extraction with the highest accuracy. QCP provides near-linear scalability on multi-processor machines, enabling design teams to reduce runtimes and speed timing closure. It also addresses multi-corner process, voltage and temperature (PVT) problems that emerge at 28 nm by enabling additional corners to be extracted with only a minimal increase in runtime. 

About Magma

Top semiconductor makers worldwide use Magma’s electronic design automation (EDA) software to produce chips for electronic applications including tablet computing devices, mobile devices such as smartphones, electronic games, digital video, networking, military/aerospace and memory. Magma products provide the “Fastest Path to Silicon”™ and include software for digital design, analog implementation, mixed-signal design, physical verification, circuit simulation, characterization and yield management. The company maintains headquarters in San Jose, Calif., and offices throughout North America, Europe, Japan, Asia and India. Magma’s stock trades on Nasdaq under the ticker symbol LAVA. Follow Magma on Twitter at www.Twitter.com/MagmaEDA and on Facebook atwww.Facebook.com/Magma. Visit Magma Design Automation on the Web at www.magma-da.com

Leave a Reply

featured blogs
Sep 19, 2024
I just saw an awesome presidential debate remix video by David Scott (a.k.a. the Kiffness). I'd never heard of David before. I'll never forget him now....

featured paper

A game-changer for IP designers: design-stage verification

Sponsored by Siemens Digital Industries Software

In this new technical paper, you’ll gain valuable insights into how, by moving physical verification earlier in the IP design flow, you can locate and correct design errors sooner, reducing costs and getting complex designs to market faster. Dive into the challenges of hard, soft and custom IP creation, and learn how to run targeted, real-time or on-demand physical verification with precision, earlier in the layout process.

Read more

featured chalk talk

GaN FETs: D-Mode Vs E-mode
Sponsored by Mouser Electronics and Nexperia
The use of gallium nitride can offer higher power efficiency, increased power density and can reduce the overall size and weight of many industrial, automotive, and data center applications. In this episode of Chalk Talk, Amelia Dalton and Giuliano Cassataro from Nexperia investigate the benefits of Gan FETs, the difference between D-Mode and E-mode GaN FET technology and how you can utilize GaN FETs in your next design.
Mar 25, 2024
31,802 views