WILSONVILLE, Ore., March 1, 2011—Mentor Graphics Corporation (NASDAQ: MENT) and GLOBALFOUNDRIES today announced that the companies have extended their collaboration on computational lithography to the 28nm technology node. Building on a successful deployment at 65nm and 45nm, GLOBALFOUNDRIES will leverage Mentor’s Calibre® computational lithography platform to support its advanced mask production needs at 28nm. The announcement underscores the two companies’ commitment to collaboration in order to deliver enablement technology for advanced nodes.
“Mentor continues to distinguish itself through its commitment to partnership in both technology delivery and technical support,” said Mojy Chian, Senior Vice President Design Enablement at GLOBALFOUNDRIES. “The collaboration between Mentor and GLOBALFOUNDRIES results in high-performance foundry capabilities from design enablement through mask data preparation. It helps us to achieve our aggressive goal of providing world-class foundry services to our customers at advanced process nodes.”
“The Calibre manufacturing platform, including Calibre nmOPC, provides accuracy and speed, together with low cost of ownership,” said Joseph Sawicki, Vice President and General Manager of the Design-to-Silicon division of Mentor Graphics. “Our partnership helps ensure that GLOBALFOUNDRIES has the mask manufacturing flow it needs to compete successfully in the foundry market.”
About Mentor Graphics
Mentor Graphics Corporation (NASDAQ: MENT) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world’s most successful electronic, semiconductor and systems companies. Established in 1981, the company reported revenues over the last 12 months of about $915 million. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777. World Wide Web site: http://www.mentor.com/.
